Chairs

	Ralf Bergmann BIAS - Bremer Institut für Angewandte Strahltechnik (DE)
	Bernd Bodermann Physikalisch Technische Bundesanstalt (DE)

Synopsis

This Topical Meeting is designed as a forum for application-oriented basic and applied optical metrology techniques. This includes basic methods, fundamental limits, measurement techniques and their applications, foundations of applied metrology as well as future trends and topics. As optical metrology methods are generally non-contact, non-destructive, fast, reliable, have a high precision and can sometimes even be used in a rugged environment, they lend themselves very much to industrial applications such as process development, in line processing and quality control.

However, since industrial demands  are sometimes very specific and increasingly challenging, there is a continuous requirement for more ruggedness, higher resolution, faster measurement and evaluation to name only a few constraints. This situation not only calls for evolutionary improvement, but also asks for new ideas or even new paradigms. However, besides developing new methods and paradigms, also rigorous modelling and simulations deserve due attention, especially in the emerging fields of computational metrology. Finally, an assessment on the absolute performance in terms of resolution and measurement uncertainty stresses the role of traceability to internationally recognized primary metrology standards. These, in turn, translate into calibration efforts to obtain metrically valid and consistent results.

EOSAM is an excellent opportunity not only to focus on the frontiers of optical metrology, but also to interact with many international experts on neighbouring topics, such as Optical System Design, Biophotonics, Metamaterials or Diffractive Optics. We are looking forward to meeting you in Porto!